Title :
UV-LIGA and DRIE grating microfabrication and testing for sheet beam amplifiers at 220 GHz
Author :
Joye, Colin D. ; Calame, Jeffrey P. ; Garven, Morag ; Park, Doewon ; Bass, Robert ; Levush, Baruch
Author_Institution :
Naval Res. Lab., Washington, DC, USA
Abstract :
Slow-wave sheet beam amplifiers are under development at NRL to demonstrate 50 watts CW at 220 GHz. We report on the microfabrication of amplifier gratings based on Ultraviolet Lithography (UV-LIGA) techniques using the SU-8 Photoresist for thick films. Deep Reactive Ion etching (DRIE) has also been investigated for grating circuits. An improved cold test fixture is being developed for the cold test process.
Keywords :
LIGA; microfabrication; photoresists; slow wave structures; sputter etching; submillimetre wave amplifiers; ultraviolet lithography; DRIE grating microfabrication; DRIE testing; SU-8 photoresist; UV-LIGA grating microfabrication; UV-LIGA technique; UV-LIGA testing; amplifier grating; cold test fixture; cold test process; deep reactive ion etching; frequency 220 GHz; grating circuit; power 50 W; slow-wave sheet beam amplifier; thick film; ultraviolet lithography; Copper; Fabrication; Fixtures; Gratings; Plasmas; Resists; Silicon;
Conference_Titel :
Infrared Millimeter and Terahertz Waves (IRMMW-THz), 2010 35th International Conference on
Conference_Location :
Rome
Print_ISBN :
978-1-4244-6655-9
DOI :
10.1109/ICIMW.2010.5612561
