UV-LIGA and DRIE grating microfabrication and testing for sheet beam amplifiers at 220 GHz

Author

Joye, Colin D. ; Calame, Jeffrey P. ; Garven, Morag ; Park, Doewon ; Bass, Robert ; Levush, Baruch

Author_Institution

Naval Res. Lab., Washington, DC, USA

fYear

2010

fDate

5-10 Sept. 2010

Firstpage

1

Lastpage

2

Abstract

Slow-wave sheet beam amplifiers are under development at NRL to demonstrate 50 watts CW at 220 GHz. We report on the microfabrication of amplifier gratings based on Ultraviolet Lithography (UV-LIGA) techniques using the SU-8 Photoresist for thick films. Deep Reactive Ion etching (DRIE) has also been investigated for grating circuits. An improved cold test fixture is being developed for the cold test process.

Keywords

LIGA; microfabrication; photoresists; slow wave structures; sputter etching; submillimetre wave amplifiers; ultraviolet lithography; DRIE grating microfabrication; DRIE testing; SU-8 photoresist; UV-LIGA grating microfabrication; UV-LIGA technique; UV-LIGA testing; amplifier grating; cold test fixture; cold test process; deep reactive ion etching; frequency 220 GHz; grating circuit; power 50 W; slow-wave sheet beam amplifier; thick film; ultraviolet lithography; Copper; Fabrication; Fixtures; Gratings; Plasmas; Resists; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Infrared Millimeter and Terahertz Waves (IRMMW-THz), 2010 35th International Conference on

Conference_Location

Rome

Print_ISBN

978-1-4244-6655-9

Type

conf

DOI

10.1109/ICIMW.2010.5612561

Filename

5612561