DocumentCode
271293
Title
55 dB DC gain, robust to PVT single-stage fully differential amplifier on 45 nm SOI-CMOS technology
Author
GoÌmez, H. ; Espinosa, G.
Author_Institution
Dept. of Electron. Eng., UNISANGIL, San Gil, Colombia
Volume
50
Issue
10
fYear
2014
fDate
May 8 2014
Firstpage
737
Lastpage
739
Abstract
The design of a single-stage operational transconductance amplifier is presented, which uses self-cascode transistors and current shunt stages to improve its DC gain. The proposed amplifier is implemented in a standard 45 nm silicon on insulator CMOS process. Simulation results show that the amplifier has a DC gain above 50 dB despite physical and environmental variations with a minimum gain bandwidth product of 540 MHZ and more than 55° phase margin. In addition, the simulated transient behaviour is shown to be robust, with a slew rate of 500 V/μs and a settling time of 7 ns with 1% accuracy for a CL of 0.3 pF.
Keywords
CMOS analogue integrated circuits; UHF amplifiers; UHF integrated circuits; differential amplifiers; elemental semiconductors; integrated circuit design; operational amplifiers; silicon; silicon-on-insulator; GBW product; PM; PVT single-stage fully differential amplifier; SOI-CMOS technology; SR; Si; bandwidth 540 MHz; capacitance 0.3 pF; current shunt stage; gain 55 dB; minimum gain bandwidth product; phase margin; self-cascode transistor; silicon on insulator; simulated transient behaviour; single-stage operational transconductance amplifier; size 45 nm; slew rate; time 7 ns;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el.2014.0883
Filename
6824045
Link To Document