DocumentCode
2713162
Title
Impact of process variability on BEOL TDDB lifetime model assessment
Author
Croes, K. ; Kocaay, D. ; Ciofi, I. ; Bommels, J. ; Tokei, Zs
Author_Institution
imec, Leuven, Belgium
fYear
2015
fDate
19-23 April 2015
Abstract
We investigate the impact of process variability on BEOL TDDB lifetime model assessment. The change in functional form of TDDB lifetime plots due to line-to-line variability and line-edge-roughness has been quantified in the field range in which long term TDDB measurements have been obtained. We found that the Pearson R2, which is used as a measure of linearity of a lifetime plot, did not significantly change due to process variability. Where process variability has a significant effect on TDDB and needs to be taken into account during data analysis, our simulations suggest that it does not have an impact on BEOL TDDB lifetime model assessment. We propose that the conclusions from recent literature reports which point in the direction of a less conservative model compared to the √E-model are valid, although they do not take process variability into account during the data analysis.
Keywords
data analysis; integrated circuit modelling; √E-model; BEOL TDDB lifetime model assessment; Pearson R2; TDDB measurement; data analysis; line-edge-roughness; line-to-line variability; process variability; Analytical models; Data models; Dielectric breakdown; Dielectrics; Physics; Reliability; BEOL; Lifetime model; TDDB;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium (IRPS), 2015 IEEE International
Conference_Location
Monterey, CA
Type
conf
DOI
10.1109/IRPS.2015.7112777
Filename
7112777
Link To Document