Title :
Optical absorption and Photoluminescence in ultra thin silver and silver iodide films
Author :
Gnanavel, M. ; Sunandana, C.S.
Author_Institution :
Sch. of Phys., Univ. of Hyderabad, Hyderabad
Abstract :
Silver thin films in the thickness range 3-10 nm produced by thermal evaporation onto glass substrates were systematically iodized and carefully characterized by XRD, AFM and optical absorption and cw photoluminescence (PL) spectroscopy while the uniodized films are X-ray amorphous in view of their quasi-continuous nature and 2D islanded structure, briefly-iodized films showed characteristic beta AgI structure. Optical absorption spectra of uniodized Ag films show intense surface plasmon resonance (SPR) features with maxima at 440, 484 and 498 nm for the films of thickness 3, 5 and 10 nm. PL shows a thickness dependent emission suggesting the involvement of Frenkel defects in non-radiative recombination.
Keywords :
Frenkel defects; X-ray diffraction; atomic force microscopy; island structure; optical films; optical glass; photoluminescence; silver compounds; surface plasmon resonance; vacuum deposited coatings; visible spectra; 2D islanded structure; AFM; AgI; Frenkel defect; X-ray amorphous; XRD; glass substrate; nonradiative recombination; optical absorption spectra; photoluminescence spectroscopy; quasicontinuous nature; silver iodide film; size 3 nm to 10 nm; surface plasmon resonance; thermal evaporation; ultra thin silver film; wavelength 440 nm; wavelength 484 nm; wavelength 498 nm; Amorphous materials; Electromagnetic wave absorption; Glass; Optical films; Photoluminescence; Plasmons; Silver; Spectroscopy; Stimulated emission; X-ray scattering;
Conference_Titel :
PhotonicsGlobal@Singapore, 2008. IPGC 2008. IEEE
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-3901-0
Electronic_ISBN :
978-1-4244-2906-6
DOI :
10.1109/IPGC.2008.4781352
