Title :
Antireflective microstructures for silicon photodetector surfaces
Author :
Dinescu, A. ; Conache, G. ; Gavrila, R.
Author_Institution :
IMT, Bucharest, Romania
Abstract :
A photodetector efficiency is closely related to the light quantity trapped inside the structure. To reduce the reflectance, microstructures of different shapes can be carved by photolithographic and anisotropic etching procedures on silicon wafers meant to be used in photodetecting devices. Areas of inverted pyramids and deep vertical-wall grooves obtained in this way on (100) and [110]-oriented single-crystal silicon wafers were characterized by reflectance measurements.
Keywords :
crystal microstructure; etching; photodetectors; photolithography; reflectivity; silicon; surface texture; Si; anisotropic etching; antireflective microstructures; deep vertical-wall grooves; inverted pyramid areas; light trapping; photodetecting devices; photodetector efficiency; photodetector surface; photolithography; reflectance measurement; reflectance reduction; single-crystal silicon wafer; Anisotropic magnetoresistance; Conductivity; Geometry; Microstructure; Optical reflection; Photodetectors; Reflectivity; Silicon; Surface texture; Wet etching;
Conference_Titel :
Semiconductor Conference, 2004. CAS 2004 Proceedings. 2004 International
Print_ISBN :
0-7803-8499-7
DOI :
10.1109/SMICND.2004.1402848
