DocumentCode
2715240
Title
Two-dimensional photonic crystals fabricated by wet etching of silicon
Author
Kim, Jung-Il ; Jeon, Seok-Gy ; Kim, Geun-Ju ; Kim, Jaehong ; Lee, Huyn-Haeng ; Park, Si-Hyun
Author_Institution
Korea Electrotechnol. Res. Inst., Ansan, South Korea
fYear
2010
fDate
5-10 Sept. 2010
Firstpage
1
Lastpage
2
Abstract
Two-dimensional photonic crystals (PCs) are fabricated by using the wet chemical etching of high-resistivity silicon. The formation of the photonic band gap at a frequency of about 100 GHz is demonstrated by the measured and the 3D FDTD simulated transmittance of the transverse magnetic (TM) mode.
Keywords
elemental semiconductors; etching; finite difference time-domain analysis; optical fabrication; photonic band gap; photonic crystals; silicon; 3D FDTD simulated transmittance; Si; high-resistivity silicon; photonic band gap; transverse magnetic mode; two-dimensional photonic crystals; wet chemical etching; Etching; Finite difference methods; Frequency measurement; Photonic crystals; Silicon; Solid modeling; Three dimensional displays;
fLanguage
English
Publisher
ieee
Conference_Titel
Infrared Millimeter and Terahertz Waves (IRMMW-THz), 2010 35th International Conference on
Conference_Location
Rome
Print_ISBN
978-1-4244-6655-9
Type
conf
DOI
10.1109/ICIMW.2010.5612736
Filename
5612736
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