DocumentCode
2715440
Title
Method of scanning near-field optical lithography
Author
Dryakhlushin, V.F. ; Vostokov, N.V. ; Klimov, Alexander Yu ; Rogov, Vladimir V. ; Shashkin, V.I.
Author_Institution
Inst. for Phys. of Microstructure, Acad. of Sci., Nizhny Novgorod, Russia
fYear
2002
fDate
9-13 Sept. 2002
Firstpage
453
Lastpage
454
Abstract
A contact scanning near-field optical lithography method has been developed to enable fabrication of different nanoelements; (metal, dielectric, etched in surface or its combinations) on the various surfaces (metal, dielectric, light- and heavy doped semiconductors). The method involves interaction of heated probe of scanning near-field optical microscope with two-layer coating, followed by pattern transfer onto sample surface. The software for creation of different nanoelements; is developed. The nanoelements; with characteristic dimensions of about 50 nm are fabricated.
Keywords
nanotechnology; near-field scanning optical microscopy; photolithography; 50 nm; nanoelement fabrication; pattern transfer; scanning near-field optical lithography; scanning near-field optical microscope; two-layer coating; Dielectrics; Fabrication; IEEE catalog; Lithography; Microstructure; Nanotechnology; Optical microscopy; Organizing; Physics; Probes;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Telecommunication Technology, 2002. CriMiCo 2002. 12th International Conference
Print_ISBN
966-7968-12-X
Type
conf
DOI
10.1109/CRMICO.2002.1137312
Filename
1137312
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