Title :
Ultrahigh-speed 1.55-μm photodiodes on Si with low-loss millimeter-wave waveguides
Author :
Royter, Y. ; Minotani, T. ; Ishii, H. ; Hirata, A. ; Yagi, S. ; Machida, K. ; Furuta, T. ; Ishibashi, T. ; Sasaki, A. ; Nagatsuma, Tadao
Author_Institution :
NTT Telecommun. Energy Labs., Atsugi, Japan
Abstract :
1.55 μm photodiodes with >150 GHz bandwidth were fabricated directly on a silicon substrate. These devices show characteristics similar to the ones fabricated on InP. Furthermore, a new thick dielectric damascene technology is developed to fabricate high-performance high-frequency interconnects on Si. Wafer bonding can be extended to other high-speed devices and the thick dielectric process can be used to improve other devices, such as antennas. Both of these innovations together should make it possible to integrate complex Si VLSI-based systems with millimeter-wave microwave active and passive components and optoelectronic devices
Keywords :
MIMIC; coplanar waveguides; integrated circuit interconnections; integrated optoelectronics; microwave photonics; optical interconnections; photodiodes; very high speed integrated circuits; wafer bonding; 1.55 micron; CPW integration; Si; complex VLSI-based systems; electro-optic sampling; high-performance high-frequency interconnects; low-loss millimeter-wave waveguides; silicon substrate; thick dielectric damascene technology; ultrahigh-speed photodiodes; wafer bonding; Bandwidth; Dielectric devices; Dielectric substrates; Indium phosphide; Microwave devices; Millimeter wave technology; Photodiodes; Silicon; Technological innovation; Wafer bonding;
Conference_Titel :
Lasers and Electro-Optics Society 2000 Annual Meeting. LEOS 2000. 13th Annual Meeting. IEEE
Conference_Location :
Rio Grande
Print_ISBN :
0-7803-5947-X
DOI :
10.1109/LEOS.2000.890788