DocumentCode :
2720266
Title :
Dual threshold delay model for nonlinear device characterization
Author :
Tomita, Yasuhiro ; Iwanishi, Nobufusa ; Yamaguchi, Ryuichi ; Edamatsu, Hisakazu
Author_Institution :
Semicond. Res. Center, Matsushita Electr. Ind. Co. Ltd., Osaka, Japan
fYear :
1995
fDate :
1-4 May 1995
Firstpage :
371
Lastpage :
374
Abstract :
We propose a dual threshold delay model for accurate timing definition for cell-based LSI designs by introducing dual threshold voltage definitions for each cell and by making cell delay and wire delay positive. Our model aims at high density and low power design of sub-half micron CMOS devices. Further more, this model solves negative delay problem in conventional delay definition at very slow slope and accurate delay handling becomes possible in logic simulation and logic synthesis
Keywords :
CMOS digital integrated circuits; delays; integrated circuit design; integrated circuit modelling; large scale integration; logic design; timing; 0.5 micron; cell delay; cell-based LSI designs; dual threshold delay model; logic simulation; logic synthesis; low power design; nonlinear device characterization; sub-half micron CMOS devices; timing definition; wire delay; Capacitance; Circuit simulation; Delay effects; Inverters; Large scale integration; Region 2; Semiconductor device modeling; Threshold voltage; Timing; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Custom Integrated Circuits Conference, 1995., Proceedings of the IEEE 1995
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-2584-2
Type :
conf
DOI :
10.1109/CICC.1995.518205
Filename :
518205
Link To Document :
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