Title :
A total TCAD environment for DFM
Author :
Newsam, M.I. ; Fallon, M. ; Walton, A.J.
Author_Institution :
Dept. of Electr. Eng., Edinburgh Univ., UK
Abstract :
This paper presents an integrated software environment that is used as part of a Design For Manufacturability (DFM) procedure. The software allows users to integrate simulation software with statistical analysis, incorporating Design Of Experiments (DOE) and contour plots. Techniques for investigating process variations are included allowing the process designer to choose the optimum processing conditions, and set realistic specifications on the process parameters
Keywords :
circuit CAD; design for manufacture; design of experiments; integrated circuit design; integrated circuit manufacture; semiconductor process modelling; statistical analysis; DFM; Design For Manufacturability; Design Of Experiments; TCAD; contour plots; integrated software; process design; simulation; statistical analysis;
Conference_Titel :
Improving the Efficiency of IC Manufacturing Technology, IEE Colloquium on
Conference_Location :
London
DOI :
10.1049/ic:19950923
