Determining capability of 0.6 μm CMOS process using design of experiments

This paper presents an overview of the Design for Manufacturability approach for a new 0.6 μm CMOS technology. Using experimentally designed simulations, the influences of process variations are characterised in order to establish the capability of the new process. Design of Experiments, regression models and contour plots of the derived response surfaces provide an answer to the question of manufacturability, i.e. whether the process yields reproducibly. Main process variations are pinpointed and a theoretical prediction of the parameter spread due to the process fluctuations is provided