Title :
GHz-range SAW device using nano-meter electrode fabrication technology
Author :
Yamanouchi, Kazuhiko
fDate :
Oct. 31 1994-Nov. 3 1994
Abstract :
Nano-meter lithography technology is very important for high density integrated circuits and higher frequency-range SAW devices. The frequency ranges of mobile communication systems are now in the 1 GHz region and extending to 2-4 GHz. Moreover SAW devices require a frequency range of around 10 GHz. Nano-meter technology below 0.1 μm is required. In this paper, nano-meter fabrication processing with various types of fine lithography technology, electrode fabrication for GHz SAW devices and low-loss filters using unidirectional transducers are described, The lift-off lithography techniques for a 10 GHz SAW IDT using direct wafer electron beam writing are shown. Next, new lithography techniques are reported for a 0.05 μm width IDT with thickness of about 0.03 μm on 128° Y-X LiNbO3. SAW experimental results on 10 GHz-range SAW conventional interdigital transducers and filters with an insertion loss of around 15 dB are shown. GHz-range SAW devices, low-loss filters and signal processing are also described
Keywords :
acoustic microwave devices; electrodes; electron beam lithography; etching; interdigital transducers; lithium compounds; microwave filters; nanotechnology; surface acoustic wave filters; surface acoustic wave signal processing; surface acoustic wave transducers; ultrasonic transducers; 0.03 mum; 0.05 mum; 10 GHz; 15 dB; GHz-range SAW device; LiNbO3; SAW IDT; direct wafer electron beam writing; frequency ranges; high density integrated circuits; insertion loss; interdigital transducers; lift-off lithography techniques; lithography technology; low-loss filters; mobile communication systems; nanometer electrode fabrication technology; signal processing; unidirectional transducers; Electrodes; Electron beam lithography; Etching; Interdigital transducers; Lithium materials/devices; Microwave filters; Surface acoustic wave device fabrication; Surface acoustic wave filters; Surface acoustic wave signal processing; Surface acoustic wave transducers;
Conference_Titel :
Ultrasonics Symposium, 1994. Proceedings., 1994 IEEE
Conference_Location :
Cannes, France
Print_ISBN :
0-7803-2012-3
DOI :
10.1109/ULTSYM.1994.401622
