DocumentCode
2721657
Title
Low-cost and low-loss 3D silicon interposer for high bandwidth logic-to-memory interconnections without TSV in the logic IC
Author
Sundaram, Venky ; Chen, Qiao ; Suzuki, Yuya ; Kumar, Gokul ; Liu, Fuhan ; Tummala, Rao
Author_Institution
3D Syst. Packaging Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2012
fDate
May 29 2012-June 1 2012
Firstpage
292
Lastpage
297
Abstract
This paper presents the design, fabrication and electrical characterization of a low loss and low cost non-traditional silicon interposer, demonstrating the high bandwidth chip-to-chip interconnection capability of the 3D silicon interposer, with equivalent or better performance than 3D ICs with TSVs, at a much lower cost. This scalable approach uses thin polycrystalline silicon in wafer or panel form, forms lower cost through-package-vias (TPVs) at fine pitch by special high throughput laser processes. The electrical performance is improved by thick polymer liners within the TPVs. Double side package processes for TPV metallization and RDL layers using dry film polymers and plating leads to significant cost reduction compared to single side TSV and BEOL wafer processes. Combined loss of 3mm long CPW lines and two TPVs in the low loss silicon interposer was demonstrated at less than 1dB at 10GHz. The fine pitch TPV capability and low loss of this non-traditional silicon interposer leads to 3D interposers with double side chips interconnected at equivalent bandwidth to wide bus I/O 3D ICs at a much lower cost and with better testability, thermal management and scalability.
Keywords
coplanar waveguides; integrated circuit interconnections; integrated circuit packaging; integrated logic circuits; integrated memory circuits; thermal management (packaging); three-dimensional integrated circuits; 3D silicon interposer; BEOL wafer process; CPW lines; Si; chip-to-chip interconnection capability; dry film polymers; electrical characterization; high bandwidth logic-to-memory interconnections; laser processes; logic IC; nontraditional silicon interposer; plating lead; size 3 mm; thermal management; thick polymer liner; thin polycrystalline silicon; through package vias; Bandwidth; Coplanar waveguides; Insertion loss; Laser ablation; Loss measurement; Polymers; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC), 2012 IEEE 62nd
Conference_Location
San Diego, CA
ISSN
0569-5503
Print_ISBN
978-1-4673-1966-9
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2012.6248844
Filename
6248844
Link To Document