• DocumentCode
    2721693
  • Title

    193nm photolytic mechanism in Er/Al doped silica

  • Author

    Groothoff, N. ; Lancry, M. ; Poumellec, B. ; Canning, J.

  • Author_Institution
    Sch. of Chem., Sydney Univ., Sydney, NSW
  • fYear
    2008
  • fDate
    7-10 July 2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The photolytic mechanism in erbium/ aluminium doped silica preform was determined to be two-photon absorption. Index change, determined from diffraction efficiency, primarily occurred through material densification, which is supported by additional nanometre scale surface analysis.
  • Keywords
    aluminium; densification; erbium; photolysis; refractive index; silicon compounds; two-photon processes; SiO2:Al,Er; densification; diffraction efficiency; erbium-aluminium doped silica; nanometre scale surface analysis; photolytic mechanism; two-photon absorption; wavelength 193 nm; Aluminum; Bragg gratings; Erbium; Optical fibers; Optical interferometry; Optical materials; Phase shifting interferometry; Preforms; Silicon compounds; Surface topography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Opto-Electronics and Communications Conference, 2008 and the 2008 Australian Conference on Optical Fibre Technology. OECC/ACOFT 2008. Joint conference of the
  • Conference_Location
    Sydney
  • Print_ISBN
    978-0-85825-807-5
  • Electronic_ISBN
    978-0-85825-807-5
  • Type

    conf

  • DOI
    10.1109/OECCACOFT.2008.4610326
  • Filename
    4610326
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2721693