DocumentCode :
2723098
Title :
Modeling topological changes in deformable registration
Author :
Li, Xiaoxing ; Wyatt, Chris
Author_Institution :
Bioimaging Syst. Lab., Virginia Tech, Blacksburg, VA, USA
fYear :
2010
fDate :
14-17 April 2010
Firstpage :
360
Lastpage :
363
Abstract :
Topological changes are common in brain MR images for aging or disease studies. For deformable registration algorithms, which are formulated as a variational problem and solved by the minimization of certain energy functional, topological changes can cause false deformation in the resulting vector field, and affect algorithm convergence. In this work, we focus on the effect of topological changes on diffeomorphic and inverse-consistent deformable registration algorithms, specifically, diffeomorphic demons and symmetric LDDMM. We first use a simple example to demonstrate the adverse effect of topological changes on these algorithms. Then, we propose an novel framework that can be imposed onto any existing diffeomorphic and inverse-consistent deformable registration algorithm. Our framework renders these registration algorithms robust to topological changes, where the output will consist of two components. The first is a deformation field that presents only the brain structural change which is the expected vector field if the topological change did not exist. The second component is a label map that provides a segmentation of the topological changes appeared in input images.
Keywords :
biomedical MRI; brain; deformation; image registration; image segmentation; medical image processing; MR imaging; algorithm convergence; brain; diffeomorphic demons algorithms; inverse-consistent deformable registration algorithm; segmentation; topological changes; vector field; Aging; Brain modeling; Deformable models; Diseases; Image segmentation; Lesions; Multiple sclerosis; Neoplasms; Pathology; Shape measurement; Deformable registration; segmentation; topological change;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Biomedical Imaging: From Nano to Macro, 2010 IEEE International Symposium on
Conference_Location :
Rotterdam
ISSN :
1945-7928
Print_ISBN :
978-1-4244-4125-9
Electronic_ISBN :
1945-7928
Type :
conf
DOI :
10.1109/ISBI.2010.5490334
Filename :
5490334
Link To Document :
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