DocumentCode
27234
Title
Carbon Ion Production Using a High-Power Impulse Magnetron Sputtering Glow Plasma
Author
Yukimura, Ken ; Nakano, Hisato Ogiso Shizuka ; Nakao, Satomi ; Takaki, K.
Author_Institution
Nanoelectron. Res. Inst., Nat. Inst. of Adv. Ind. Sci. & Technol.-Tsukuba Central, Tsukuba, Japan
Volume
41
Issue
10
fYear
2013
fDate
Oct. 2013
Firstpage
3012
Lastpage
3020
Abstract
The ionization rate of sputtered carbon species in magnetron sputtering glow plasmas is low because of a low sputtering yield, a high ionization energy and a low reaction rate between the carbon and electron in the plasma. In this paper, efficient ionization of sputtered carbon species is realized in high-power impulse magnetron sputtering (HiPIMS) glow plasma. The arrangement of the permanent magnet placed at the back of the target can recover the above issues, which enables a power consumption as high as over 100 kW with a pulse duration as short as 5.5 μs at a source voltage as high as 2200 V. The magnet arrangement affects the production zone of the HiPIMS glow plasma on the target; the plasma moves outward to the radial direction of the target with an increased number of the inner magnets. When the plasma has a larger diameter on the target, a glow easily transits to an arc discharge even at a lower voltage compared with the case of the small-diameter plasma production, because the distance between the plasma and the grounded plate becomes short. Both the highest target voltage without an arc transition and the highest glow current are obtained at n=1, the least number of the inner magnet. In this case, a source voltage of 2200 V brings into the highest instantaneous power of about 144 kW. It is confirmed that higher the source voltage, higher the intensity of the optical emission spectrometry spectrum of carbon ions is. The high power consumption contributes to the high-density argon plasma production. Hence, the least number of the inner magnet results in a higher acceleration energy to bombard the target to efficiently sputter carbon species and a high ion flux bombarding to the target. The longer pulse duration such as 30 μs results in an arc transition at the source voltage as low as 1200 V. Thus, the highest emission intensity of the carbon optical emission obtained for n=1 at 2200 V with 5.5- μs pulse duration. It is observed tha- the intensities of the optical emission from argon and carbon ions are proportional to the power consumed in the plasma.
Keywords
carbon; glow discharges; ion beam effects; photoluminescence; plasma materials processing; power consumption; sputter deposition; C; acceleration energy; arc discharge; carbon ion production; emission intensity; high-power impulse magnetron sputtering glow plasma; ion flux bombarding; ionization energy; optical emission spectrometry spectrum; permanent magnet; power consumption; voltage 2200 V; Argon; Carbon; Ionization; Magnetic flux; Plasmas; Sputtering; Arc transition; carbon; high-power impulse magnetron sputtering (HiPIMS); high-power pulsed magnetron sputtering (HPPMS); magnetic field; optical emission;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2013.2280916
Filename
6612692
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