• DocumentCode
    2723617
  • Title

    Development of a stacked WCSP package platform using TSV (Through Silicon Via) technology

  • Author

    Dunne, Rajiv ; Takahashi, Yoshimi ; Mawatari, Kazuaki ; Matsuura, Masamitsu ; Bonifield, Tom ; Steinmann, Philipp ; Stepniak, Dave

  • Author_Institution
    Texas Instrum. Inc., Dallas, TX, USA
  • fYear
    2012
  • fDate
    May 29 2012-June 1 2012
  • Firstpage
    1062
  • Lastpage
    1067
  • Abstract
    To enable the miniaturization, electrical performance and heterogeneous functionality needs for emerging Analog applications, a stacked Wafer-level Chip Scale Package (WCSP) package platform has been developed using Through-Silicon Via (TSV) technology. This allows stacking of ICs, MEMS, passives and other components in the vertical direction onto active or passive TSV wafers, to create innovative System-in-Package (SiP) product solutions. Since Analog devices are small in size and cost is a key care about, a careful selection of the integration flow is required to achieve a low cost packaging solution. In this work, an integration flow for the stacked WCSP package is presented, along with development details for the Chip-on-Wafer (CoW) bonding and wafer overmolding unit processes. The test vehicle was 3mm × 3mm in size and used 25u diameter Cu TSVs in a 200mm diameter wafer. Interconnect reliability evaluations were done with different micro-bump Under Bump Metallurgy (UBM) and TSV tip surface finish metallization combinations. Wafer ovemolding development included warpage, saw and adhesion evaluations with multiple mold materials. A back-end assembly flow was established with a mass reflow bonding process and an overmold material with low CTE and intermediate Tg and modulus. Samples were prepared with mold-on-die and exposed die package structures. Excellent time-zero yields were obtained, with an average TSV micro-bump interconnect resistance of 25 mohms. Results and failures modes from preliminary reliability testing are included.
  • Keywords
    integrated circuit bonding; integrated circuit packaging; moulding; stacking; system-in-package; three-dimensional integrated circuits; Cu; IC stacking; MEMS; TSV micro-bump interconnect; WCSP package platform; active TSV wafers; analog devices; back-end assembly flow; chip-on-wafer bonding; die package structures; interconnect reliability; mass reflow bonding process; micro-bump under bump metallurgy; mold-on-die; passive TSV wafers; passives components; size 200 mm; size 3 mm; system-in-package; through silicon via technology; wafer ovemolding development; wafer overmolding unit processes; wafer-level chip scale package; Assembly; Bonding; Joints; Materials; Semiconductor device reliability; Through-silicon vias;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2012 IEEE 62nd
  • Conference_Location
    San Diego, CA
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4673-1966-9
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2012.6248967
  • Filename
    6248967