DocumentCode :
2724186
Title :
Sub-micron chip ESD protection schemes which avoid avalanching junctions
Author :
Worley, E.R. ; Gupta, R. ; Jones, B. ; Kjar, R. ; Nguyen, C. ; Tennyson, M.
Author_Institution :
Rockwell Telecommun., Newport Beach, CA, USA
fYear :
1995
fDate :
12-14 Sept. 1995
Firstpage :
13
Lastpage :
20
Abstract :
Because of leakage problems related to avalanche breakdown of salicided junctions, an array of ESD protection methods has been developed and tested which depend on forward biased diodes and normal MOSFET conduction. These methods include the case of multiple power supplies, the case where the pad voltage can exceed the power supply voltage, and the case where the pad voltage both exceeds the power supply voltage and the process voltage limit. These methods result in parts made in 0.8 and 0.6 /spl mu/m salicided technologies routinely passing our upper division spec. of /spl plusmn/4500 V HBM without any discernible increase in pin leakage. Also, split supply salicided parts pass 1 kV of CDM with no discernible pin leakage increase and 2 kV with pin leakage increase but within spec. (10 /spl mu/A).
Keywords :
electrostatic discharge; integrated circuit technology; leakage currents; monolithic integrated circuits; protection; 0.6 micron; 0.8 micron; 1 kV; 10 muA; 2 kV; ESD protection schemes; MOSFET conduction; forward biased diodes; multiple power supplies; pad voltage; pin leakage; salicided junctions; submicron chip protection; Avalanche breakdown; Diodes; Electrostatic discharge; MOSFET circuits; Power supplies; Protection; Testing; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Overstress/Electrostatic Discharge Symposium Proceedings, 1995
Conference_Location :
Phoenix, AZ, USA
Print_ISBN :
1-878303-59-7
Type :
conf
DOI :
10.1109/EOSESD.1995.478263
Filename :
478263
Link To Document :
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