• DocumentCode
    2724375
  • Title

    A novel ESD protection technique for submicron CMOS/BiCMOS technologies

  • Author

    Kwon, Kyuhyung ; Park, Hyungrae ; Kim, Daegyu ; Park, Kilseo ; Jin, Joohyun ; Lim, Sunkwon

  • Author_Institution
    MICRO Process Dev. Team, Samsung Electron. Co. Ltd., Buchun, South Korea
  • fYear
    1995
  • fDate
    12-14 Sept. 1995
  • Firstpage
    21
  • Lastpage
    26
  • Abstract
    In this paper, we present a novel electrostatic discharge (ESD) protection device. When an ESD pulse attacks, this device is activated as either a reverse-biased punchthrough BJT or a forward-biased diode, depending on the polarity of the input pulse. Experimental results (based on the Human-Body Model) show that the new protection device is more efficient and area-effective than any other conventional one. It does not require any extra mask for its implementation because of the compatibility with established processes. Thus we believe that it is a viable approach for the protection of submicron CMOS/BiCMOS devices and circuits vulnerable to ESD stress.
  • Keywords
    BiCMOS integrated circuits; CMOS integrated circuits; bipolar transistors; electrostatic discharge; failure analysis; integrated circuit technology; protection; semiconductor diodes; ESD protection technique; Human-Body Model; PIPE; electrostatic discharge; forward-biased diode; input pulse polarity; punchthrough BJT; reverse-biased punchthrough device; submicron BiCMOS technologies; submicron CMOS technologies; BiCMOS integrated circuits; CMOS technology; Diodes; Electrostatic discharge; Protection; Semiconductor device modeling; Stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Overstress/Electrostatic Discharge Symposium Proceedings, 1995
  • Conference_Location
    Phoenix, AZ, USA
  • Print_ISBN
    1-878303-59-7
  • Type

    conf

  • DOI
    10.1109/EOSESD.1995.478264
  • Filename
    478264