Title :
A novel ESD protection technique for submicron CMOS/BiCMOS technologies
Author :
Kwon, Kyuhyung ; Park, Hyungrae ; Kim, Daegyu ; Park, Kilseo ; Jin, Joohyun ; Lim, Sunkwon
Author_Institution :
MICRO Process Dev. Team, Samsung Electron. Co. Ltd., Buchun, South Korea
Abstract :
In this paper, we present a novel electrostatic discharge (ESD) protection device. When an ESD pulse attacks, this device is activated as either a reverse-biased punchthrough BJT or a forward-biased diode, depending on the polarity of the input pulse. Experimental results (based on the Human-Body Model) show that the new protection device is more efficient and area-effective than any other conventional one. It does not require any extra mask for its implementation because of the compatibility with established processes. Thus we believe that it is a viable approach for the protection of submicron CMOS/BiCMOS devices and circuits vulnerable to ESD stress.
Keywords :
BiCMOS integrated circuits; CMOS integrated circuits; bipolar transistors; electrostatic discharge; failure analysis; integrated circuit technology; protection; semiconductor diodes; ESD protection technique; Human-Body Model; PIPE; electrostatic discharge; forward-biased diode; input pulse polarity; punchthrough BJT; reverse-biased punchthrough device; submicron BiCMOS technologies; submicron CMOS technologies; BiCMOS integrated circuits; CMOS technology; Diodes; Electrostatic discharge; Protection; Semiconductor device modeling; Stress;
Conference_Titel :
Electrical Overstress/Electrostatic Discharge Symposium Proceedings, 1995
Conference_Location :
Phoenix, AZ, USA
Print_ISBN :
1-878303-59-7
DOI :
10.1109/EOSESD.1995.478264