DocumentCode :
2724738
Title :
Comparisons of noise spectroscopy analyze and microplasma noise sources
Author :
Vanek, J. ; Dolensky, J. ; Chobola, Z. ; Lunak, M.
Author_Institution :
Dept. of Electrotechnol., Brno Univ. of Technol., Brno, Czech Republic
fYear :
2010
fDate :
16-19 May 2010
Firstpage :
469
Lastpage :
473
Abstract :
As it was the mechanical noise used for diagnostic of machine in the past, the electronic noise can be used as diagnostic tool for detection defects in electronical devices and systems in the future. This paper deals with comparisons of noise spectroscopy and detection of microplasma noise sources in the three new type of solar cells G1, G3 and G5. When high electric is applied to PN junction with some technological imperfections like dislocation in PN junction or crystal-grid defect causing non-homogeneity of parameters it produces in tiny areas of enhanced impact ionization called microplasma. It can leads onwards to deterioration in quality or to destruction of PN junction. Microplasma produced noise, which has random spectrum in frequency range. Microplasma noise is measurable even before the creation of light emissions. Due to the comparisons microplasma detection with noise characteristic can full analyzed solar cell.
Keywords :
ionisation; p-n junctions; solar cells; PN junction; crystal-grid defect; detection defects; diagnostic tool; electronic noise; light emissions; microplasma noise source detection; noise spectroscopy; solar cells; Etching; Frequency; Impact ionization; Microelectronics; Photovoltaic cells; Semiconductor thin films; Silicon; Spectroscopy; Surface finishing; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics Proceedings (MIEL), 2010 27th International Conference on
Conference_Location :
Nis
Print_ISBN :
978-1-4244-7200-0
Type :
conf
DOI :
10.1109/MIEL.2010.5490442
Filename :
5490442
Link To Document :
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