Title :
Fully-integrated CMOS RF amplifiers
Author :
Baliweber, B. ; Gupta, R. ; Allstot, D.J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Oregon State Univ., Corvallis, OR, USA
Abstract :
Parasitics associated with transistors and on-chip passive components, such as inductors and capacitors, as well as the package, limit the performance of RF integrated circuits. Modifications to the IC fabrication process, special packaging techniques, and the use of off-chip components improve RFIC performance at the expense of cost and size of the final product. Design of fully-monolithic RFICs, however, requires extensive use of sophisticated CAD tools to mitigate the impact of the aforementioned parasitic effects. Use of a CAD technique optimizes design of a distributed amplifier and a balanced power amplifier. These amplifiers are designed in a 0.6 /spl mu/m digital CMOS process, and use only on-chip spiral inductors with Q-values in the range of 2-4. Both amplifiers are fully-integrated, with the power amplifier requiring an off-chip balun for interfacing with the measurement equipment, and the distributed amplifier requiring only off-chip coupling capacitors.
Keywords :
CMOS analogue integrated circuits; MMIC amplifiers; UHF amplifiers; UHF integrated circuits; circuit CAD; distributed amplifiers; inductors; integrated circuit design; integrated circuit packaging; 0.6 micron; CAD technique; CMOS RF amplifiers; IC fabrication process; Q-values; RFIC performance; balanced power amplifier; digital CMOS process; distributed amplifier; off-chip balun; off-chip components; off-chip coupling capacitors; on-chip passive components; on-chip spiral inductors; packaging techniques; parasitic effects; parasitics; sophisticated CAD tools; Capacitors; Design automation; Distributed amplifiers; Fabrication; Inductors; Integrated circuit packaging; Power amplifiers; Radio frequency; Radiofrequency amplifiers; Radiofrequency integrated circuits;
Conference_Titel :
Solid-State Circuits Conference, 1999. Digest of Technical Papers. ISSCC. 1999 IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-5126-6
DOI :
10.1109/ISSCC.1999.759107