DocumentCode :
2729203
Title :
Future of Nano-CMOS Technology and Its Production
Author :
Iwai, Hiroshi
Author_Institution :
Frontier Collaborative Res. Center, Tokyo Inst. of Technol., Yokohama
fYear :
2006
fDate :
3-7 July 2006
Firstpage :
1
Lastpage :
17
Abstract :
This paper focuses on the future semiconductor manufacturing challenges. Some background information regarding the possible limits of scaling and the problems appeared in the sub-100 nm devices will be discussed, respectively, in section 2 and 3. The impacts of the future semiconductor manufacturing will be discussed in section 4. We shall also look forward to the possible geographical redistribution of the manufacturing centers and the new role playing of the present leaders in IC technology. Paradigm of post-downsizing era will be described in section 5
Keywords :
nanotechnology; semiconductor device manufacture; IC technology; nano-CMOS technology; semiconductor manufacturing; Electron tubes; Electronic circuits; Intelligent robots; Intelligent sensors; Large scale integration; MOSFETs; Production; Silicon; Transistors; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2006. 13th International Symposium on the
Conference_Location :
Singapore
Print_ISBN :
1-4244-0205-0
Electronic_ISBN :
1-4244-0206-9
Type :
conf
DOI :
10.1109/IPFA.2006.250988
Filename :
4017013
Link To Document :
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