Title :
Future of Nano-CMOS Technology and Its Production
Author_Institution :
Frontier Collaborative Res. Center, Tokyo Inst. of Technol., Yokohama
Abstract :
This paper focuses on the future semiconductor manufacturing challenges. Some background information regarding the possible limits of scaling and the problems appeared in the sub-100 nm devices will be discussed, respectively, in section 2 and 3. The impacts of the future semiconductor manufacturing will be discussed in section 4. We shall also look forward to the possible geographical redistribution of the manufacturing centers and the new role playing of the present leaders in IC technology. Paradigm of post-downsizing era will be described in section 5
Keywords :
nanotechnology; semiconductor device manufacture; IC technology; nano-CMOS technology; semiconductor manufacturing; Electron tubes; Electronic circuits; Intelligent robots; Intelligent sensors; Large scale integration; MOSFETs; Production; Silicon; Transistors; Ultra large scale integration;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2006. 13th International Symposium on the
Conference_Location :
Singapore
Print_ISBN :
1-4244-0205-0
Electronic_ISBN :
1-4244-0206-9
DOI :
10.1109/IPFA.2006.250988