DocumentCode
2729208
Title
Non-Volatile Memory Technology-Today and Tomorrow
Author
Lu, Chih-Yuan ; Lu, Tao-Cheng ; Liu, Rich
Author_Institution
Macronix Int. Co., Inc., Hsinchu
fYear
2006
fDate
3-7 July 2006
Firstpage
18
Lastpage
23
Abstract
Despite strong scaling limitations for both NOR and NAND flash memories, solutions to continue the Moore´s law are also emerging. For NOR flash memory, 2-bit/cell NROM, BE-SONOS and phase-change chalcogenide memory show promise to scale below 35nm node. For NAND flash memory, new nitride storage devices such as TANOS and BE-SONOS are candidates for < 30 nm devices
Keywords
flash memories; random-access storage; 2-bit/cell NROM; BE-SONOS; Moore law; NAND flash memory; NOR flash memory; TANOS; nonvolatile memory technology; phase-change chalcogenide memory; Biological information theory; Electrons; Explosives; Flash memory; Insulation; MOSFET circuits; Nonvolatile memory; Random access memory; Space technology; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits, 2006. 13th International Symposium on the
Conference_Location
Singapore
Print_ISBN
1-4244-0205-0
Electronic_ISBN
1-4244-0206-9
Type
conf
DOI
10.1109/IPFA.2006.250989
Filename
4017014
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