• DocumentCode
    2729463
  • Title

    Diffractive lenses for high resolution laser based failure analysis

  • Author

    Zachariasse, Frank ; Goossens, Martijin

  • Author_Institution
    Philips Semicond., Nijmegen
  • fYear
    2006
  • fDate
    3-7 July 2006
  • Firstpage
    95
  • Lastpage
    96
  • Abstract
    In this paper, we demonstrate a practical alternative to the conventional SIL, which overcomes the above limitations. We show that it is possible to fabricate a lens directly on the back side of the silicon of the device under test. This lens works on principles of diffractive optics and is around 250 nm thick. The lens may be fabricated in about 1 hour, using a combination of FIB ion implantation lithography, followed by plasma etching. In combination with a commercial IR microscope objective, the lens shows diffraction-limited resolution as expected from its numerical aperture. It should be noted that the lens works only for monochromatic light, but this is not a drawback when applied to laser based techniques
  • Keywords
    diffraction gratings; failure analysis; focused ion beam technology; ion implantation; semiconductor device reliability; semiconductor lasers; sputter etching; FIB ion implantation lithography; IR microscope objective; diffraction limited resolution; diffractive lenses; failure analysis; high resolution laser; laser based techniques; monochromatic light; plasma etching; Failure analysis; Ion implantation; Lenses; Lithography; Optical diffraction; Particle beam optics; Plasma applications; Plasma devices; Silicon; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits, 2006. 13th International Symposium on the
  • Conference_Location
    Singapore
  • Print_ISBN
    1-4244-0205-0
  • Electronic_ISBN
    1-4244-0206-9
  • Type

    conf

  • DOI
    10.1109/IPFA.2006.251006
  • Filename
    4017031