DocumentCode
2729463
Title
Diffractive lenses for high resolution laser based failure analysis
Author
Zachariasse, Frank ; Goossens, Martijin
Author_Institution
Philips Semicond., Nijmegen
fYear
2006
fDate
3-7 July 2006
Firstpage
95
Lastpage
96
Abstract
In this paper, we demonstrate a practical alternative to the conventional SIL, which overcomes the above limitations. We show that it is possible to fabricate a lens directly on the back side of the silicon of the device under test. This lens works on principles of diffractive optics and is around 250 nm thick. The lens may be fabricated in about 1 hour, using a combination of FIB ion implantation lithography, followed by plasma etching. In combination with a commercial IR microscope objective, the lens shows diffraction-limited resolution as expected from its numerical aperture. It should be noted that the lens works only for monochromatic light, but this is not a drawback when applied to laser based techniques
Keywords
diffraction gratings; failure analysis; focused ion beam technology; ion implantation; semiconductor device reliability; semiconductor lasers; sputter etching; FIB ion implantation lithography; IR microscope objective; diffraction limited resolution; diffractive lenses; failure analysis; high resolution laser; laser based techniques; monochromatic light; plasma etching; Failure analysis; Ion implantation; Lenses; Lithography; Optical diffraction; Particle beam optics; Plasma applications; Plasma devices; Silicon; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits, 2006. 13th International Symposium on the
Conference_Location
Singapore
Print_ISBN
1-4244-0205-0
Electronic_ISBN
1-4244-0206-9
Type
conf
DOI
10.1109/IPFA.2006.251006
Filename
4017031
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