• DocumentCode
    2730858
  • Title

    Application of the latency insertion method (LIM) to the modeling of CDM ESD events

  • Author

    Klokotov, Dmitri ; Shukla, Vrashank ; Schutt-Ainé, José ; Rosenbaum, Elyse

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA
  • fYear
    2010
  • fDate
    1-4 June 2010
  • Firstpage
    652
  • Lastpage
    656
  • Abstract
    In this paper, the application of the latency insertion method (LIM) to the analysis of charged device model (CDM) electrostatic discharge (ESD) events in integrated circuits (ICs) is discussed. LIM is proposed as an alternative to existing techniques commonly used for chip-level circuit simulation of CDM ESD. Such simulators, based on the modified nodal analysis (MNA) method, can underperform in cases that require very large model sizes. LIM was developed specifically for the analysis of fast transient phenomena in very large networks and is more robust and less resource-hungry than conventional methods.
  • Keywords
    Biological system modeling; Circuit simulation; Circuit testing; Conducting materials; Delay; Electrostatic discharge; Integrated circuit modeling; Semiconductor device manufacture; Substrates; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference (ECTC), 2010 Proceedings 60th
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    0569-5503
  • Print_ISBN
    978-1-4244-6410-4
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2010.5490800
  • Filename
    5490800