DocumentCode
2730858
Title
Application of the latency insertion method (LIM) to the modeling of CDM ESD events
Author
Klokotov, Dmitri ; Shukla, Vrashank ; Schutt-Ainé, José ; Rosenbaum, Elyse
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Illinois at Urbana-Champaign, Urbana, IL, USA
fYear
2010
fDate
1-4 June 2010
Firstpage
652
Lastpage
656
Abstract
In this paper, the application of the latency insertion method (LIM) to the analysis of charged device model (CDM) electrostatic discharge (ESD) events in integrated circuits (ICs) is discussed. LIM is proposed as an alternative to existing techniques commonly used for chip-level circuit simulation of CDM ESD. Such simulators, based on the modified nodal analysis (MNA) method, can underperform in cases that require very large model sizes. LIM was developed specifically for the analysis of fast transient phenomena in very large networks and is more robust and less resource-hungry than conventional methods.
Keywords
Biological system modeling; Circuit simulation; Circuit testing; Conducting materials; Delay; Electrostatic discharge; Integrated circuit modeling; Semiconductor device manufacture; Substrates; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference (ECTC), 2010 Proceedings 60th
Conference_Location
Las Vegas, NV, USA
ISSN
0569-5503
Print_ISBN
978-1-4244-6410-4
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2010.5490800
Filename
5490800
Link To Document