DocumentCode :
2731572
Title :
Lifetime Enhancement under High Frequency NBTI measured on Ring Oscillators
Author :
Nigam, Tanya ; Harris, E.B.
Author_Institution :
Cypress Semicond., San Jose, CA
fYear :
2006
fDate :
26-30 March 2006
Firstpage :
289
Lastpage :
293
Abstract :
In this paper, we studied the frequency degradation of ring oscillators (ROs) fabricated using 130nm technology. We demonstrate that for ROs operating at high temperatures in the frequency-range of 100MHz to 3GHz, Negative bias temperature instability (NBTI) is the dominant frequency degradation mechanism. The NBTI-lifetime measured on ROs is 4 decades longer than that of DC-stressed devices. A recovery of RO frequency is observed when stress is reduced, similar to stress relaxation in DC stress mode. Based on RO degradation data measured up to 3 GHz, we conclude that for circuits operating in a continuous switching mode, NBTI will not be a show stopper
Keywords :
circuit reliability; circuit stability; oscillators; stress relaxation; 0.1 to 3 GHz; 130 nm; DC stress mode; continuous switching mode; frequency degradation; lifetime enhancement; negative bias temperature instability; ring oscillators; stress relaxation; Degradation; Frequency measurement; Niobium compounds; Nitrogen; Ring oscillators; Stress; Switches; Switching circuits; Switching frequency; Titanium compounds; NBTI; Ring Oscillator; relaxation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium Proceedings, 2006. 44th Annual., IEEE International
Conference_Location :
San Jose, CA
Print_ISBN :
0-7803-9498-4
Electronic_ISBN :
0-7803-9499-2
Type :
conf
DOI :
10.1109/RELPHY.2006.251230
Filename :
4017171
Link To Document :
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