• DocumentCode
    2731785
  • Title

    Substrate Majority Carrier Induced NLDMOS Failure and Its Prevention in Advanced Smart Power Technologies

  • Author

    Zhu, R. ; Khemka, V. ; Bose, A. ; Roggenbauer, T.

  • Author_Institution
    Freescale Semicond. Inc., Tempe, AZ
  • fYear
    2006
  • fDate
    26-30 March 2006
  • Firstpage
    356
  • Lastpage
    359
  • Abstract
    This paper discusses substrate majority carrier conduction and prevention for a NLDMOS device in smart power technologies. A multi-iso isolated NLDMOS is proposed and experimentally verified to eliminate the problem. Trade-off between device size, safe operating area, substrate current and NLDMOS device power dissipation has been studied
  • Keywords
    charge injection; power MOSFET; NLDMOS device; carrier conduction; power dissipation; safe operating area; smart power technologies; substrate current; Automotive engineering; DC motors; Diodes; Implants; Isolation technology; Power dissipation; Power integrated circuits; Pulse width modulation; Substrates; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium Proceedings, 2006. 44th Annual., IEEE International
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    0-7803-9498-4
  • Electronic_ISBN
    0-7803-9499-2
  • Type

    conf

  • DOI
    10.1109/RELPHY.2006.251243
  • Filename
    4017183