DocumentCode
2732465
Title
Fabrication of InGaAs quantum wire structures by As2 flux in molecular beam epitaxy
Author
Sugaya, Takeyoshi ; Tanuma, Yasuhiko ; Nakagawa, Tadashi ; Sugiyama, Yoshinobu ; Yonei, Kenji
Author_Institution
Electrotech. Lab., Tsukuba, Japan
fYear
1997
fDate
8-11 Sep 1997
Firstpage
75
Lastpage
78
Abstract
InGaAs/InAlAs quantum wire structures on V-grooved substrates have been fabricated under As2 flux by molecular beam epitaxy. Under As2 flux, a smaller number of In atoms migrate than those under As4 flux to the V-groove bottom from the sidewall surface. The InAlAs layer on the V-grooved InP substrates grown under As 2 flux preserves the V-shape, whereas the V-shape cannot be preserved and the quantum wire structures cannot be fabricated under As 2 flux. The InGaAs quantum wires grown under As2 flux have good optical property
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; molecular beam epitaxial growth; semiconductor growth; semiconductor quantum wires; As2; As2 flux; As4; As4 flux; InGaAs quantum wire structures; InGaAs-InAlAs; InGaAs/InAlAs quantum wire structures; V-grooved substrates; molecular beam epitaxy; Atomic layer deposition; Etching; Fabrication; Indium compounds; Indium gallium arsenide; Indium phosphide; MOCVD; Molecular beam epitaxial growth; Substrates; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Compound Semiconductors, 1997 IEEE International Symposium on
Conference_Location
San Diego, CA
Print_ISBN
0-7503-0556-8
Type
conf
DOI
10.1109/ISCS.1998.711566
Filename
711566
Link To Document