DocumentCode :
2734287
Title :
Elemental Redistribution and Diffusion Path Configuration Near the Edge of Sn-95Pb Solder Bump/Ni-Cu UBM Joints after Aging in the Flip-Chip Technology
Author :
Tsai, S.Y. ; Lee, C.R. ; Chiou, G.J. ; Duh, J.G.
Author_Institution :
Dept. of Chem. Eng., Minghsin Univ. of Sci. & Technol., Hsin-Fong
fYear :
2005
fDate :
27-29 June 2005
Firstpage :
1
Lastpage :
6
Abstract :
The formation and growth of intermetallic compounds (IMC) play a critical role in the solder joint reliability. In this study, joint assembly of high lead Sn-95Pb/Ni-Cu was employed to study the interfacial reaction and related IMC formation after aging at 150degC for 168, 500, 1000, 2000, and 3000 hrs, respectively. Special effort was focused on the investigation near the edge of solder joints. Field-emission SEM and electron probe microanalyzer (EPMA) were used to evaluate the interfacial morphology and the compositions of IMC, respectively. For joints aged for 168 hrs, (Cu,Ni)6Sn5 and (Ni,Cu)3Sn4 IMCs were observed. However, another IMC (Cu,Ni)3Sn was revealed after more than 500 hrs aging. The elemental redistribution near the edge of the solder joint was further probed by the X-ray color mapping technique in EPMA. In combination of the quantitative analysis for IMC in various region of the joint, the measured compositions could be mapped onto the ternary isotherm of Sn-Ni-Cu to elucidate the phase transformation among various types of IMCs. On the basis of the elemental redistribution of Sn, Ni, and Cu under various periods of aging, the kinetics process of related IMC formation was formulated. Series of diffusion paths were then constructed, which, in turn, provided an effective approach in the interpretation of the phase transformation in related IMCs
Keywords :
ageing; copper alloys; electron probe analysis; flip-chip devices; interface structure; lead alloys; metallisation; nickel alloys; reliability; scanning electron microscopy; solders; surface phase transformations; tin alloys; (CuNi)3Sn; (CuNi)6Sn5; (NiCu)3Sn4; 1000 hrs; 150 C; 168 hrs; 2000 hrs; 3000 hrs; 500 hrs; Sn-95Pb solder bump; SnPb; UBM joints; X-ray color mapping technique; aging; electron probe microanalyzer; elemental redistribution; field-emission SEM; flip-chip technology; interfacial morphology; interfacial reaction; intermetallic compounds; joint assembly; kinetics process; phase transformation; solder joint reliability; ternary isotherm; Aging; Assembly; Electrons; Intermetallic; Lead; Morphology; Phase measurement; Probes; Soldering; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Density Microsystem Design and Packaging and Component Failure Analysis, 2005 Conference on
Conference_Location :
Shanghai
Print_ISBN :
0-7803-9292-2
Electronic_ISBN :
0-7803-9293-0
Type :
conf
DOI :
10.1109/HDP.2005.251382
Filename :
4017423
Link To Document :
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