• DocumentCode
    2734832
  • Title

    Circuit Tracks on 3-D Thermoplastic Surfaces

  • Author

    Laine-Ma, Teija ; Kujansuu, Jani ; Pesonen, Matti ; Määttänen, Jarmo

  • Author_Institution
    Tampere Univ. of Technol., Pori
  • fYear
    2005
  • fDate
    27-29 June 2005
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    Circuit tracks on the surface of flame retardant 3D thermoplastics give new possibilities for electronic design and for miniaturization of electronic devices. Many production stages of circuit pattern application on 3D thermoplastic devices set thermal and chemical resistance requirements for the plastic material. These material requirements depend on the manufacturing methods chosen. In our experiments the metallization of thermoplastics was done by using magnetron sputtering. A thin Ni/Cr layer (0.2 mum) with a subsequent copper layer (2-3 mum) was sputtered onto the thermoplastics. The final copper layer was grown electrolytically. Circuit patterns on the 3D thermoplastic surfaces were made by using an electro deposit (ED) photo resist. The Ni/Cr layer could be also utilized as a thin film resistance material. Thin film resistors were produced in the same manufacturing process by increasing the number of manufacturing stages with another photoimaging/etching stage. In this paper we investigated the suitability of several thermoplastics as a substrate for circuit patterns. The mechanical, thermal and electrical properties of the plastic substrates are essential in our evaluation. The capability of the magnetron sputtering process in metallization was evaluated by measuring the variation of the thickness of sputtered metal layers on different shapes. The adhesion of the sputtered metallic layer to the thermoplastics was measured with a peel strength test
  • Keywords
    chromium alloys; copper alloys; metallisation; nickel alloys; plastics; sputter deposition; 0.2 micron; 2 to 3 micron; 3D thermoplastic surfaces; NiCr-Cu; chemical resistance requirements; circuit pattern; circuit tracks; electrical property; electro deposit photo resist; flame retardant thermoplastics; magnetron sputtering; material requirements; mechanical property; metallization method; peel strength test; plastic material; plastic substrates; thermal property; thermal resistance; thermoplastic devices; thin film resistance material; thin film resistors; Chromium; Copper; Magnetic materials; Manufacturing processes; Metallization; Plastics; Sputtering; Surface resistance; Thermal resistance; Thin film circuits; 3-D thermoplastics; Circuit tracks; ED photo resist; Ni/Cr thin film; adhesion; sputtering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    High Density Microsystem Design and Packaging and Component Failure Analysis, 2005 Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    0-7803-9292-2
  • Electronic_ISBN
    0-7803-9293-0
  • Type

    conf

  • DOI
    10.1109/HDP.2005.251414
  • Filename
    4017455