Title :
Piezoelectric photoacoustic spectra of silicon at liquid helium temperature
Author :
Ikari, T. ; Matsuyama, H. ; Nakashima, A. ; Futagami, K.
fDate :
Oct. 31 1994-Nov. 3 1994
Abstract :
Photoacoustic (PA) measurements of p- and n-Si single crystals are carried out at liquid helium temperature (4.2 K). Two peaks are observed around 1.2 eV in both samples. They vanish when the temperature increases to 20 K. The energies of the peaks agree with thresholds of exciton absorption with the emission of momentum-conserving phonons. However, the lower energy peak shifts to the higher energy side with the decrease of the intensity of the incident light. We also observe an annealing behavior of PA spectra of p-Si at 4.2 K. Fine structures of the PA spectra below the band gap were observed. This indicates that the PA measurements at very low temperature may be a useful tool to investigate the electronic transitions
Keywords :
annealing; elemental semiconductors; energy gap; excitons; phonon spectra; photoacoustic spectra; piezoelectric semiconductors; silicon; 1.2 eV; 20 K; 4.2 K; Si; annealing; band gap; electronic transitions; exciton absorption thresholds; fine structures; liquid He temperature; momentum-conserving phonons emission; n-type; p-type; photoacoustic measurements; piezoelectric photoacoustic spectra; single crystals; very low temperature; Annealing; Photoacoustic spectroscopy; Piezoelectric semiconductor materials/devices; Silicon materials/devices;
Conference_Titel :
Ultrasonics Symposium, 1994. Proceedings., 1994 IEEE
Conference_Location :
Cannes, France
Print_ISBN :
0-7803-2012-3
DOI :
10.1109/ULTSYM.1994.401749