• DocumentCode
    273573
  • Title

    The future of bipolar transistors

  • Author

    Aloïsi, P.A.

  • Author_Institution
    Motorola Semicond., Paris, France
  • fYear
    1988
  • fDate
    13-15 Jul 1988
  • Firstpage
    67
  • Lastpage
    70
  • Abstract
    The bipolar power transistor technology is in permanent evolution under the pressure of two important parameters: a request from power system designers for an increase in ruggedness (SOA, RBSOA, ES/B), an improvement in switching times, a decrease in drop voltage and easy to drive products; and the automation and control of wafer processing in order to improve the quality, the electrical parameter distribution, service and cost of power semiconductors. The author discusses the latest developments on the high voltage bipolar transistor model in the vertical and the horizontal parts of the transistor structure. Raw silicon and high voltage diffusion technologies are also studied. Some improvement possibilities, or a better electrical parameter distribution are also described
  • Keywords
    bipolar transistors; bipolar transistors; electrical parameter distribution; high voltage bipolar transistor model; high voltage diffusion technologies; horizontal structure; vertical structure;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Power Electronics and Variable-Speed Drives, Third International Conference on
  • Conference_Location
    London
  • Print_ISBN
    0-85296-364-5
  • Type

    conf

  • Filename
    23315