• DocumentCode
    2735759
  • Title

    12.4% efficient freestanding 30µm ultra-thin silicon solar cell using a-Si/c-Si heterostructure

  • Author

    Chhabra, Bhumika ; Opila, Robert L. ; Honsberg, Christiana B.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Univ. of Delaware, Newark, DE, USA
  • fYear
    2010
  • fDate
    20-25 June 2010
  • Abstract
    The goal of this work is to demonstrate and analyze heterojunction devices on ultra-thin silicon wafers with imperfect surfaces and lower minority carrier lifetimes. Our previous results show intrinsic amorphous-Si passivation (i-a-Si) gives surface recombination velocity, S ~ 20 cm/sec on freestanding 35 μm Si wafers (Chhabra et al., 2008), and the work presented in this paper shows S ~ 84 cm/sec on chemically etched wafers. The degradation in the S values is assumed mainly due to the contamination in the PECVD deposition system. The simulated results for this work show that the dominant loss mechanism is the low absorption in the a-Si layer thickness. The device results show that even without light trapping, texturing, optimizations, and with minority carrier lifetimes ~ 18 μs, the structure can have realistic voltages ~ 613 mV and efficiencies ~ 12.4%.
  • Keywords
    carrier lifetime; passivation; plasma CVD; silicon; solar cells; surface recombination; PECVD deposition system; Si-Si; carrier lifetimes; chemically etched wafers; dominant loss mechanism; heterojunction devices; intrinsic amorphous-Si passivation; light trapping; size 30 mum; surface recombination velocity; ultra-thin silicon solar cell; ultra-thin silicon wafers; Green products; Radiative recombination; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE
  • Conference_Location
    Honolulu, HI
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4244-5890-5
  • Type

    conf

  • DOI
    10.1109/PVSC.2010.5614352
  • Filename
    5614352