GHz low-loss SAW filters employing standard fabrication process

The authors present SAW (surface acoustic wave) filter techniques suitable for low-loss operation. These techniques are based on a newly developed submicron photolithography as the appropriate mass-production low-cost pattern fabrication process. Two filters have been designed and realized at 1.7 GHz and 2.5 GHz, which corresponds to electrode widths of 0.6 μm and 0.4 μm, respectively. The filters provide an insertion loss of 6 dB and a stopband rejection of about 40 dB. The dual-track technique has been applied with the advantage of local separated structure parts responsible for low-loss operation and high selectivity