DocumentCode :
2738979
Title :
Aligned silicon nanowire arrays for achieving black nonreflecting silicon surface
Author :
Hung, Yung-Jr ; Wu, Kai-Chung ; Lee, San-Liang ; Pan, Yen-Ting
Author_Institution :
Dept. of Electron. Eng., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
fYear :
2011
fDate :
10-12 Jan. 2011
Firstpage :
61
Lastpage :
62
Abstract :
A new fabrication process, which includes deposition of thin silver film on silicon surface prior to wet etching, is proposed for realizing aligned silicon nanowires with high uniformity, resulting in black nonreflecting silicon surface.
Keywords :
elemental semiconductors; etching; metallic thin films; nanofabrication; nanowires; optical fabrication; optical films; semiconductor quantum wires; silicon; silver; Ag-Si; Si; aligned silicon nanowire arrays; black nonreflecting silicon surface; optical fabrication; thin silver film; wet etching; Fabrication; Films; Silicon; Silver; Wet etching; metal-induced Si etching; silicon nanowire array;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Winter Topicals (WTM), 2011 IEEE
Conference_Location :
Keystone, CO
Print_ISBN :
978-1-4244-8428-7
Type :
conf
DOI :
10.1109/PHOTWTM.2011.5730046
Filename :
5730046
Link To Document :
بازگشت