DocumentCode
2739491
Title
Nano-Crossbar Arrays for Nonvolatile Resistive RAM (RRAM) Applications
Author
Nauenheim, C. ; Kügeler, C. ; Rüdiger, A. ; Waser, R. ; Flocke, A. ; Noll, T.G.
Author_Institution
Inst. of Solid State Res. - IFF-6, Forschungszentrum Julich GmbH, Julich
fYear
2008
fDate
18-21 Aug. 2008
Firstpage
464
Lastpage
467
Abstract
We present a fast and flexible method for the fabrication of nano-crossbar arrays with a feature size of 100 nm. TiO2 is integrated and electrically characterized as the nonvolatile resistively switching material. This structure serves as a key component for the investigation of novel high density nonvolatile resistive RAM cores.
Keywords
nanolithography; nanopatterning; random-access storage; semiconductor storage; titanium compounds; TiO2-Ti; device fabrication; nanocrossbar arrays; nonvolatile resistive RAM; nonvolatile resistively switching material; Circuits; Electrodes; Electron beams; Fabrication; Lithography; Nonvolatile memory; Random access memory; Read-write memory; Resists; Solids;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
Conference_Location
Arlington, TX
Print_ISBN
978-1-4244-2103-9
Electronic_ISBN
978-1-4244-2104-6
Type
conf
DOI
10.1109/NANO.2008.141
Filename
4617123
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