DocumentCode
2739823
Title
DuPont Fluorochemical materials in TSV process
Author
Lee, Terry
Author_Institution
DuPont Fluorochemical/DuPont Taiwan Ltd., Taipei
fYear
2008
fDate
22-24 Oct. 2008
Firstpage
249
Lastpage
250
Abstract
As a result of Montreal Protocol, CFCs included Freon TES and Genesolv DES in electronic assemblies cleaning as well as de-flux solvent for Surface Mounting Technology, SMT, in PCB industry has been banned for production. DuPont fluorochemical came up with the effective alternative, Vertrelreg, with zero ODP (Ozone Depletion Potential) as special fluids for cleaning and which also is proven as an effective fluorinated polymer remover in Through Silicon Via, TSV, process required of the advance package industry. Beyond the solution of polymer remover, DuPont Fluorochemical also introduces the cost effective Zyronreg C4F8 in the Deep Reactive Ion Etching, DRIE, process of the TSV required.
Keywords
electronics packaging; sputter etching; DuPont fluorochemical materials; Vertrel; cleaning; deep reactive ion etching; fluorinated polymer remover; package industry; through silicon via process; zero ozone depletion potential; Assembly; Cleaning; Electronics industry; Industrial electronics; Polymers; Production; Protocols; Solvents; Surface-mount technology; Through-silicon vias;
fLanguage
English
Publisher
ieee
Conference_Titel
Microsystems, Packaging, Assembly & Circuits Technology Conference, 2008. IMPACT 2008. 3rd International
Conference_Location
Taipei
Print_ISBN
978-1-4244-3623-1
Electronic_ISBN
978-1-4244-3624-8
Type
conf
DOI
10.1109/IMPACT.2008.4783857
Filename
4783857
Link To Document