• DocumentCode
    2739823
  • Title

    DuPont Fluorochemical materials in TSV process

  • Author

    Lee, Terry

  • Author_Institution
    DuPont Fluorochemical/DuPont Taiwan Ltd., Taipei
  • fYear
    2008
  • fDate
    22-24 Oct. 2008
  • Firstpage
    249
  • Lastpage
    250
  • Abstract
    As a result of Montreal Protocol, CFCs included Freon TES and Genesolv DES in electronic assemblies cleaning as well as de-flux solvent for Surface Mounting Technology, SMT, in PCB industry has been banned for production. DuPont fluorochemical came up with the effective alternative, Vertrelreg, with zero ODP (Ozone Depletion Potential) as special fluids for cleaning and which also is proven as an effective fluorinated polymer remover in Through Silicon Via, TSV, process required of the advance package industry. Beyond the solution of polymer remover, DuPont Fluorochemical also introduces the cost effective Zyronreg C4F8 in the Deep Reactive Ion Etching, DRIE, process of the TSV required.
  • Keywords
    electronics packaging; sputter etching; DuPont fluorochemical materials; Vertrel; cleaning; deep reactive ion etching; fluorinated polymer remover; package industry; through silicon via process; zero ozone depletion potential; Assembly; Cleaning; Electronics industry; Industrial electronics; Polymers; Production; Protocols; Solvents; Surface-mount technology; Through-silicon vias;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems, Packaging, Assembly & Circuits Technology Conference, 2008. IMPACT 2008. 3rd International
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-3623-1
  • Electronic_ISBN
    978-1-4244-3624-8
  • Type

    conf

  • DOI
    10.1109/IMPACT.2008.4783857
  • Filename
    4783857