DocumentCode
2740233
Title
On the nature of radiative recombination processes in GaN
Author
Wetzel, Christian ; Amano, Hiroshi ; Akasaki, Isamu
Author_Institution
High Tech. Res. Center, Meijo Univ., Nagoya, Japan
fYear
1997
fDate
8-11 Sep 1997
Firstpage
239
Lastpage
244
Abstract
A mechanism for efficient radiative light emission in GaN is presented. Stokes shifted emission was found to propagate almost exclusively along the c-plane when excited deep behind this surface. The onset of stimulated emission is observed. Emission intensity increases with the magnitude of the Stokes shift which in turn increases with film thickness, i.e. reduced biaxial stress conditions. We propose a model for the levels nature based on the strong oscillator of the heavy hole A-transition and its crystal field coupling to the small density of states associated the light hole B-transition. Highest emission is found for bulk-like stress conditions where the valence band top is found to be formed by the light hole mass
Keywords
III-V semiconductors; gallium compounds; internal stresses; photoluminescence; semiconductor thin films; stimulated emission; valence bands; wide band gap semiconductors; GaN; Stokes shift; Stokes shifted emission; biaxial stress conditions; bulk-like stress conditions; c-plane; crystal field coupling; density of states; efficient radiative light emission; emission intensity; film thickness; heavy hole A-transition; light hole B-transition; light hole mass; radiative recombination processes; stimulated emission; valence band top; Gallium nitride; Laser excitation; Lattices; Optical buffering; Optical films; Photoluminescence; Radiative recombination; Spectroscopy; Stimulated emission; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Compound Semiconductors, 1997 IEEE International Symposium on
Conference_Location
San Diego, CA
Print_ISBN
0-7503-0556-8
Type
conf
DOI
10.1109/ISCS.1998.711626
Filename
711626
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