DocumentCode :
2740567
Title :
Photolithographic Patterning of Bacteriorhodopsin Films
Author :
Anton, Christopher M. ; Friedrich, Craig R. ; Lueking, Donald R.
Author_Institution :
Dept. of Mech. Eng.-Eng. Mech., Michigan Technol. Univ., Houghton, MI
fYear :
2008
fDate :
18-21 Aug. 2008
Firstpage :
660
Lastpage :
663
Abstract :
A novel bacteriorhodopsin (bR) patterning technique utilizing photolithographic processes is presented. This process allows the oriented deposition and patterning of dried bR thin films onto flat substrates. Standard lithographic techniques are used to pattern the substrate and electrodeposition is used to deposit and orient the purple membrane film, which contains bR. An acetone sonication bath is used to remove the resist and pattern the membrane. The physical and photoelectric properties of dried PM films are shown to be undamaged by the patterning process, and patterns with 60 mum feature sizes are shown. PM liquid suspension density prior to electrodeposition as well as acetone sonication time are reported on.
Keywords :
electrodeposition; membranes; photolithography; proteins; thin films; PM liquid suspension density; acetone sonication bath; bacteriorhodopsin films; bacteriorhodopsin patterning; dried bR thin films; electrodeposition; flat substrates; photoelectric properties; photolithographic patterning; photolithographic processes; physical properties; purple membrane film; resist; standard lithographic techniques; Biological materials; Biomembranes; Chromium; Coatings; Gold; Resists; Silicon; Sputtering; Substrates; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2008. NANO '08. 8th IEEE Conference on
Conference_Location :
Arlington, TX
Print_ISBN :
978-1-4244-2103-9
Electronic_ISBN :
978-1-4244-2104-6
Type :
conf
DOI :
10.1109/NANO.2008.200
Filename :
4617182
Link To Document :
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