DocumentCode
2741189
Title
Low-temperature off-state bipolar effect in floating-body PD/SOI MOSFETs
Author
Pelella, M.M. ; Fossum, J.G. ; Chuang, C.T. ; Torreiter, O.A. ; Schettler, H. ; Puri, R. ; Ketchen, M.B. ; Rosenfield, M.G.
Author_Institution
IBM, Yorktown Heights, NY, USA
fYear
2000
fDate
2000
Firstpage
84
Lastpage
85
Abstract
One option to counter the slowing CMOS scaling trend is to reduce the ambient temperature (T) of the semiconductor chip. At low operating T, increased carrier mobility, subthreshold slope, and threshold voltage (Vt) have been demonstrated for bulk-Si MOSFETs (Sun et al., 1987), thus enhancing drive current, allowing lower-Vt design, and providing significant improvement in the speed-power performance of the technology, especially for the same-off-current T-scaling scenario (Taur and Nowak, 1997). In this paper, the behavior of floating-body (FB) partially depleted (PD) SOI CMOS is evaluated at low T down to -100°C, which reflects a practical operating temperature range subject to the cost of the required cooling system. Results show that the negative T-coefficient of the FB voltage VBS (T) (Pelella et al, 1998) can lead to activation of the parasitic bipolar transistor (BJT), inducing an anomalous subthreshold current characteristic as T is reduced. They further reveal an increasing off-state current (Ioff), below a critical T, which implies a possible limit to the low-T operating range of FB PD/SOI CMOS. However, we show that device optimization can ameliorate this low-T bipolar effect, enabling a lower-T operating range and a significantly enhanced circuit performance
Keywords
CMOS integrated circuits; MOSFET; electric current; integrated circuit measurement; low-temperature techniques; semiconductor device models; silicon-on-insulator; -100 C; CMOS scaling; FB PDSOI CMOS; FB voltage; Si-SiO2; ambient temperature; bulk-Si MOSFETs; carrier mobility; circuit performance; cooling system; critical temperature; device optimization; drive current; floating-body PD/SOI MOSFETs; floating-body partially depleted SOI CMOS; low threshold voltage design; low-T bipolar effect; low-temperature off-state bipolar effect; negative temperature coefficient; off-state current; operating temperature; operating temperature range; parasitic bipolar transistor activation; same-off-current T-scaling scenario; semiconductor chip; speed-power performance; subthreshold current characteristic; subthreshold slope; threshold voltage; Bipolar transistors; CMOS technology; Cooling; Costs; Counting circuits; MOSFETs; Subthreshold current; Sun; Temperature distribution; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 2000 IEEE International
Conference_Location
Wakefield, MA
ISSN
1078-621X
Print_ISBN
0-7803-6389-2
Type
conf
DOI
10.1109/SOI.2000.892781
Filename
892781
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