Fabrication of Very Large Area of Sub-100 nm Nanopillars Using Nanosphere Lithography

Nanosphere lithography is a method that can produce large area, size-tunable patterns with high throughput and low cost. Here, large area arrays of sub-100 nm pillars were generated using the combination of nanosphere lithography and reactive ion etching techniques. Instead of directly using polystyrene particles as masks, which is soft and degradable during the etching process, we use chromium as hard mask to fabricated large area silicon or silica pillars.