A new low-emissivity films Prepared by Magnetron Sputtering

Author

Shu-rong, Dong ; De-miao, Wang

Author_Institution

Zhejiang Univ., Hangzhou

fYear

2006

fDate

18-22 Sept. 2006

Firstpage

474

Lastpage

474

Abstract

Low-emissivity (Low-E) films, which have low transparence in near infrared region, are prepared by RF magnetron reactive sputtering and DC sputtering in turn as the structure of air/TiO2/Ti/Ag/TiO2/ on the glass. Titanium layer protection Ag layer from being oxidized is observed. The transmittance of low-E films was measured by spectrophotometer. The Low-E films can get a best transmittance, while the thickness of titanium layer is about 1 nanometer. In the visible region (380 nm - 780 nm), the highest transmittance is up to 82.4%, and the average transmittance is 75%. In the near infrared region (780 nm - 2500 nm), the average transmittance is 16.2%.

Keywords

multilayers; oxidation; silver; spectrophotometry; sputtered coatings; titanium; titanium compounds; DC sputtering; RF magnetron reactive sputtering; TiO₂-Ti-Ag-TiO₂; film transmittance; low-emissivity films; multilayers; oxidization; silver layer; spectrophotometer; titanium layer; wavelength 380 nm to 780 nm; wavelength 780 nm to 2500 nm; Diffraction; Glass; Optical films; Protection; Radio frequency; Scanning electron microscopy; Spectroscopy; Sputtering; Titanium; X-ray scattering; Low-E films; Protective layer; RF magnetron sputtering; multilayer; transmittance;

fLanguage

English

Publisher

ieee

Conference_Titel

Infrared Millimeter Waves and 14th International Conference on Teraherz Electronics, 2006. IRMMW-THz 2006. Joint 31st International Conference on

Conference_Location

Shanghai

Print_ISBN

1-4244-0400-2

Electronic_ISBN

1-4244-0400-2

Type

conf

DOI

10.1109/ICIMW.2006.368682

Filename

4222416