Design and fabrication of antireflection structured surface

Author

Sixiang Chen ; Xinjian Yi ; Sihai Chen ; Zuhai Chen

Author_Institution

State Key Lab. of Laser Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China

fYear

2000

fDate

12-15 Sept. 2000

Firstpage

143

Lastpage

144

Abstract

A symmetric two-dimensional (2D) periodic structure for antireflection coating applications is investigated in detail, based on the effective medium theory. The surface-relief patterns are designed and fabricated on silicon wafers, using binary optical processing methods. The structured surfaces with symmetric patterns as single homogeneous antireflective coatings. The significant improvement of transmittance with structured surfaces is observed at 10.6 /spl mu/m long-wavelength infrared region.

Keywords

antireflection coatings; electron beam lithography; etching; optical fabrication; periodic structures; refractive index; silicon; 10.6 micron; ARC fabrication; Si; Si wafers; antireflection coating applications; antireflection structured surface; binary optical processing methods; effective medium theory; long-wavelength IR region; single homogeneous antireflective coatings; surface-relief patterns; symmetric 2D periodic structure; transmittance; two-dimensional periodic structure; Coatings; Equations; Optical crosstalk; Optical design; Optical device fabrication; Optical films; Optical polarization; Optical surface waves; Silicon; Strips;

fLanguage

English

Publisher

ieee

Conference_Titel

Infrared and Millimeter Waves, 2000. Conference Digest. 2000 25th International Conference on

Conference_Location

Beijing, China

Print_ISBN

0-7803-6513-5

Type

conf

DOI

10.1109/ICIMW.2000.892972

Filename

892972