• DocumentCode
    2744998
  • Title

    Photoluminescence of Porous Silicon Layers Oxidized in Controlled Water Vapor Conditions.

  • Author

    Vásquez-A, M.A. ; García-Salgado, G. ; Romero-Paredes, G. ; Pena-Sierra, R.

  • Author_Institution
    Dept. de Ingenieria Electrica, CINVESTAV-IPN, Mexico City
  • fYear
    2006
  • fDate
    6-8 Sept. 2006
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    A study of the evolution of the photoluminescence spectra features on chemically treated and controlled aged porous silicon layers (PSL) prepared by the electrochemical method is presented. Room temperature photoluminescence (PL) spectra of freshly prepared PSL show a characteristic peak located at ~700 nm. The PL spectrum of chemically oxidized and successively water vapor oxidized PSL strongly modifies compared to the PL spectra of freshly prepared samples. Those variations are associated with the changes on the PSL structure induced by the applied oxidization processes. The evolution of the characteristic PL features gives us the ability to identify the signal due to the quantum size effect (QSE) and to assign high energy transitions produced by some kind of defect centers
  • Keywords
    elemental semiconductors; oxidation; photoluminescence; point defects; porous semiconductors; semiconductor thin films; silicon; size effect; 293 to 298 K; Si; chemically treated porous silicon layers; controlled aged porous silicon layers; controlled water vapor conditions; defect centers; electrochemical method; high energy transitions; optical properties; oxidization processes; oxidized porous silicon layers; point defects; quantum size effect; room temperature photoluminescence spectra; thin films; Chemicals; Etching; Luminescence; Optical films; Photoluminescence; Process control; Semiconductor films; Silicon; Surface morphology; Temperature measurement; Optical properties; photoluminescence; point defects; porous silicon; thin films;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical and Electronics Engineering, 2006 3rd International Conference on
  • Conference_Location
    Veracruz
  • Print_ISBN
    1-4244-0402-9
  • Electronic_ISBN
    1-4244-0403-7
  • Type

    conf

  • DOI
    10.1109/ICEEE.2006.251918
  • Filename
    4018003