• DocumentCode
    274538
  • Title

    Novel fabrication methods of gratings for DFB lasers using ECR-CVD SiNx films

  • Author

    Sugimoto, Hiroshi ; Abe, Yuji ; Ohtsuka, Ken-ichi ; Ohishi, Toshiyuki ; Matsui, Teruhito ; Ogata, Hitoshi

  • Author_Institution
    Central Res. Lab., Mitsubishi Electr. Corp., Hyogo, Japan
  • fYear
    1988
  • fDate
    11-15 Sep 1988
  • Firstpage
    376
  • Abstract
    Quarter-wave-shifted gratings and short period gratings were fabricated by novel methods using electron cyclotron resonance plasma assisted chemical vapour deposition (ECR-CVD) SiNx films. SiN x films deposited on photoresist have a higher etching rate than those deposited on a flat substrate. The authors made good use of this difference to fabricate these gratings and 1.55 μm quarter-wave-shifted DFB lasers
  • Keywords
    diffraction gratings; distributed feedback lasers; laser accessories; optical films; optical workshop techniques; plasma CVD coatings; semiconductor junction lasers; silicon compounds; 1.55 micron; DFB lasers; ECR-CVD SiNx films quarter wave shifted gratings; SiNx; electron cyclotron resonance plasma assisted chemical vapour deposition; etching rate; fabrication methods; gratings; photoresist; short period gratings;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Optical Communication, 1988. (ECOC 88). Fourteenth European Conference on (Conf. Publ. No.292)
  • Conference_Location
    Brighton
  • Type

    conf

  • Filename
    93599
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=274538