مرکز منطقه ای اطلاع رساني علوم و فناوري - Insitu Pyrochemical Wafer Cleaning For Furnace Processing

DocumentCode :

2746173

Title :

Insitu Pyrochemical Wafer Cleaning For Furnace Processing

Author :

Bich-Yen Nguyen ; Young Limb ; Tobin, P.J. ; Huffman ; Kouba, C. ; Gonzales, S. ; Le La

Author_Institution :

Motorola

fYear :

1993

fDate :

17-19 May 1993

Firstpage :

109

Lastpage :

110

fLanguage :

English

Publisher :

ieee

Conference_Titel :

VLSI Technology, 1993. Digest of Technical Papers. 1993 Symposium on

Conference_Location :

Kyoto, Japan

Type :

conf

DOI :

10.1109/VLSIT.1993.760269

Filename :

760269

Link To Document :