DocumentCode :
2746211
Title :
Parameter extractions and a new calibration methodology for MOSFET sensors
Author :
Tang, Chun-Pai ; Chung, Hsien ; Chao, Yung-Ching ; Lwo, Ben-Je
Author_Institution :
Semicond. Lab., Nat. Defense Univ., Tahsi
fYear :
2008
fDate :
22-24 Oct. 2008
Firstpage :
53
Lastpage :
56
Abstract :
In this work, we studied the availability of p-type MOSFET with 1 mum channel width and 0.15 mum channel length as a stress sensor. Under mechanical, thermal, and thermo-mechanical coupling effects, parameters of the MOSFET devices were extracted based on a new measurement methodology, and linear relationships between drain current variation and stress and/or thermal effects were obtained. According to the measurement data, the extremely important thermal effect was also noted. It is concluded in this work that the newly experimental design and the extracted parameters are useful for MOSFET stress sensor´s design and applications.
Keywords :
MOSFET; calibration; stress effects; thermomechanical treatment; MOSFET stress sensor; calibration methodology; drain current; p-type MOSFET; parameter extraction; size 0.15 mum; size 1 mum; stress effect; thermal effects; thermo-mechanical coupling effects; Calibration; Current measurement; Data mining; MOSFET circuits; Mechanical sensors; Mechanical variables measurement; Parameter extraction; Stress measurement; Thermal stresses; Thermomechanical processes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Materials and Packaging, 2008. EMAP 2008. International Conference on
Conference_Location :
Taipei
Print_ISBN :
978-1-4244-3620-0
Electronic_ISBN :
978-1-4244-3621-7
Type :
conf
DOI :
10.1109/EMAP.2008.4784227
Filename :
4784227
Link To Document :
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