DocumentCode
2746222
Title
A pH Controlled Chemical Mechanical Polishing Method For Ultra-thin Bonded SOI Wafer
Author
Sugimoto, F. ; Horie, H. ; Arimoto, Y. ; Ito, T.
Author_Institution
Fujitsu laboratories ltd.
fYear
1993
fDate
17-19 May 1993
Firstpage
113
Lastpage
114
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1993. Digest of Technical Papers. 1993 Symposium on
Conference_Location
Kyoto, Japan
Type
conf
DOI
10.1109/VLSIT.1993.760271
Filename
760271
Link To Document