• DocumentCode
    2746232
  • Title

    Fabrication of wiregrid micropolarizers for imaging from visible to infrared wavelengths

  • Author

    Watson, Alex ; Wang, Yu ; Wu, Zhi ; Sarangan, Andrew

  • Author_Institution
    Univ. of Dayton, Dayton, OH, USA
  • fYear
    2011
  • fDate
    9-13 Oct. 2011
  • Firstpage
    99
  • Lastpage
    100
  • Abstract
    This work examines a novel approach based on a well known process in CMOS technology. A combined deep-UV interference lithography, contact printing, and Damascene metalization were used to realize wiregrid micropolarizers for use with CMOS/CCD cameras as well as infrared focal plane arrays. The Damascene process was utilized to avoid some of the difficulties in patterning high-aspect ratio metal grids.
  • Keywords
    CCD image sensors; CMOS image sensors; focal planes; metallisation; micro-optics; microfabrication; optical arrays; optical fabrication; optical polarisers; ultraviolet lithography; CCD cameras; CMOS cameras; CMOS technology; Damascene metalization; contact printing; deep-UV interference lithography; high-aspect ratio metal grids; patterning; wiregrid micropolarizers; Extinction ratio; Fabrication; Lithography; Metallization; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics Conference (PHO), 2011 IEEE
  • Conference_Location
    Arlington, VA
  • Print_ISBN
    978-1-4244-8940-4
  • Type

    conf

  • DOI
    10.1109/PHO.2011.6110444
  • Filename
    6110444
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2746232