Title :
Fabrication of wiregrid micropolarizers for imaging from visible to infrared wavelengths
Author :
Watson, Alex ; Wang, Yu ; Wu, Zhi ; Sarangan, Andrew
Author_Institution :
Univ. of Dayton, Dayton, OH, USA
Abstract :
This work examines a novel approach based on a well known process in CMOS technology. A combined deep-UV interference lithography, contact printing, and Damascene metalization were used to realize wiregrid micropolarizers for use with CMOS/CCD cameras as well as infrared focal plane arrays. The Damascene process was utilized to avoid some of the difficulties in patterning high-aspect ratio metal grids.
Keywords :
CCD image sensors; CMOS image sensors; focal planes; metallisation; micro-optics; microfabrication; optical arrays; optical fabrication; optical polarisers; ultraviolet lithography; CCD cameras; CMOS cameras; CMOS technology; Damascene metalization; contact printing; deep-UV interference lithography; high-aspect ratio metal grids; patterning; wiregrid micropolarizers; Extinction ratio; Fabrication; Lithography; Metallization; Silicon; Substrates;
Conference_Titel :
Photonics Conference (PHO), 2011 IEEE
Conference_Location :
Arlington, VA
Print_ISBN :
978-1-4244-8940-4
DOI :
10.1109/PHO.2011.6110444
