DocumentCode :
2746309
Title :
Planarized Silver Interconnect Technology With A Ti Self-Passivation Technique For Deep Sub-Micron ULSIs
Author :
Ushiku, Y. ; Ono, H. ; Lijima, T. ; Ninomiya, N. ; Nishiyama, A. ; Twai ; Hara, H.
Author_Institution :
Toshiba Corporation
fYear :
1993
fDate :
17-19 May 1993
Firstpage :
121
Lastpage :
122
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1993. Digest of Technical Papers. 1993 Symposium on
Conference_Location :
Kyoto, Japan
Type :
conf
DOI :
10.1109/VLSIT.1993.760278
Filename :
760278
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2746309